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  • InficonInficon
    • Inficon真空测量Vacuum Gauge
      • PSG500PSG500
        • PSG500[复制]PSG500
        • PSG500[复制]PSG500
      • PSG550PSG550
      • PCG550PCG550
      • PGE050PGE050
      • PGE300PGE300
      • PGE500PGE500
      • PGD500PGE500
      • BAG302BAG302
      • BAG051BAG051
      • BAG402BAG402
      • BPG400BPG400
      • BPG402-SBPG402-S
      • BCG450BCG450
      • HPG400HPG400
      • BAG050 - BAG053 & BAG055BAG050 - BAG053 & BAG055
      • MAG050MAG050
      • MAG470MAG470
      • MPG400MPG400
      • MPG500MPG500
      • MPG55x / MAG55xMPG500
      • IKR251IKR251
      • PEG100PEG100
      • CDG020DCDG020D
      • CDG025DCDG025D
      • CDG025D2CDG025D
      • CDG025D-X3CDG025D-X3
      • CDG025D-X3 4-20mACDG025D-X3
      • CDG045DCDG045D
      • CDG045D2CDG045D
      • CDG045DhsCDG045D
      • CDG100DCDG100D
      • CDG100DhsCDG100D
      • CDG100D2CDG100D
      • CDG160DCDG160D
      • Cube CDGsciCube CDGsci
      • VGC501VGC501
      • PGD400PGD400
      • VGC031VGC031
      • VGC401VGC401
      • VGC083VGC083
      • VGD500VGC083
      • OPG550VGC083
    • Inficon薄膜沉积Inficon Thin Film Deposition
      • SQC-310SQC-310
      • SQM-160SQM-160
    • LINXON myRGALINXON myRGA
    • LINXON LX218LINXON LX218
  • EdwardsEdwards
    • Edwards真空计Edwards Gauge
      • APG100APG100
      • APGX-HAPGX-H
      • AIGXAIGX
      • AIMAIM
      • WRGWRG
      • ASGASG
      • WRHWRH
      • Passive GaugePassive Gauge
      • ADCADC
      • TICTIC
    • Edwards旋片真空泵Edwards Vane Pump
      • RV12RV12
      • E2M18E2M18
      • E2M1.5E2M1.5
      • E2M40E2M40
      • E2M275E2M275
    • Edwards涡旋泵Edwards Scroll Pump
      • nXDS 15inXDS 15i
      • XDS 46iXDS 46i
      • XDS100BXDS100B
    • Edwards干式真空泵Edwards Dry Pump
    • Edwards机械增压泵Edwards Roots pump
    • Edwards高真空泵Edwards UHV pump
    • Stokes真空泵Stokes Microvac
  • Granville-PhillipsGranville-Phillips
    • GP275275 Mini-Convectron
    • GP307307 Bayard-Alpert
    • GP316316 Convectron
    • GP340340 VGC
    • GP356356 Micro-Ion Plus
    • GP350350 UHV VGC
    • GP375375 Convectron
    • GP475475 Convectron
    • GP360360 Stabil-Ion VGC
    • GP370370 Stabil-Ion VGC
    • GP358358 Micro-Ion VGC
    • GP347347 Stabil-Ion
    • GP385385 Convectron ATM
    • GP390390 Micro-Ion ATM
    • GP392392 Micro-Ion Plus
    • GP500500 Cold Cathode
    • GP330330 VGC
    • GP354354 Micro-ion
    • GP274274 Bayard-Alpert
  • InstrutechInstrutech inc
    • CVM211CVM211
    • CVM201CVM201
    • IGM401IGM401
    • CCM501CCM501
    • PCM301PCM301
    • CCM502CCM502
    • WGM701WGM701
    • CDM900CDM900
    • IGM402IGM402
    • CVG101CVG101
    • BA600BA600
    • CC605CC605
    • VGC301VGC301
    • AGC302AGC302
    • B-RAX 3400B-RAX 3400
    • FlexRax 4000FlexRax 4000
  • PfeifferPfeiffer Vacuum
    • Pfeiffer真空测量Pfeiffer真空测量
      • TPR270TPR270
      • TPR280TPR280
      • PCR280PCR280
      • IKR251IKR251
      • IKR270IKR270
      • IKR360IKR360
      • PKR251PKR251
      • PKR361PKR361
      • IMR265IMR265
      • PBR260PBR260
      • CMR361CMR361
      • CMR371CMR371
      • TPG361TPG361
      • TPG366TPG366
      • PPT200PPT200
      • RPT200RPT200
      • CPT200CPT200
      • MPT200MPT200
      • HPT200HPT200
      • TTR91TTR91
      • TTR101TTR101
      • ITR90ITR90
      • PTR225PTR225
      • PTR91PTR91
      • CCR361CCR361
      • TPG500TPG500
      • IMG400IMG400
    • DuoLine Vacuum PumpDuoLine Vacuum Pump
    • Diaphragm PumpDiaphragm Pump
    • Hicube EcoHicube Eco
  • Fil-TechFil-Tech inc
    • SQM220SQM220
  • PREVACPREVAC
    • MG13MG13
    • MG14MG14
    • MG15MG15
  • Focean TechFocean Tech
    • Flux MonitorFlux Monitor
    • Focean微型皮拉尼真空计Focean
      • PVG100微型皮拉尼真空计PVG100
  • Osaka VacuumOsaka Vacuum
    • DSPDSP
    • FR060DFR060D
    • ER100DER100D
    • TG-F SeriesTG-F Series
    • TG-M SeriesTG-M Series
    • ST SeriesST Series
  • VATIwata
    • 61.3碟形控制阀
    • 61.6 真空蝶形控制和隔离阀
    • 54.1 真空全金属角阀DN 16
    • 54.1 真空全金属角阀DN 40
    • 54.1 真空全金属角阀DN 63
  • MKPMKP
    • VIC-D200VIC-D200
    • VIC-W200VIC-W200
    • VIC-D145VIC-D145
    • CAF-145CAF-145
    • PSC-D245PSC-D245
    • EPC-220EPC-220
    • TSM-D200TSM-D200
    • Maru 7000 PIMaru 7000 PI
    • EXO-100EXO-100
    • MPR-Z200MPR-Z200
  • MKS InstrumentMKS Instrument
  • RDMathisRDMathis
    • BOAT SOURCESBOAT SOURCES
    • FILAMENTSFILAMENTS
    • Inert Gas PurifierInert Gas Purifier
  • MDC VacuumMDC Vacuum
  • DuniwayDuniway
    • Terranova 809Terranova 809
    • Terranova 905Terranova 905
    • Terranova 906ATerranova 906A
    • Terranova 907Terranova 907
    • Terranova 908ATerranova 908A
    • Terranova 921Terranova 921
    • Terranova 924ATerranova 924A
    • Terranova 926ATerranova 926A
    • Terranova 934Terranova 934
    • Terranova 960Terranova 960
    • Terranova 970Terranova 970
    • Terranova 990Terranova 990
  • ExtorrExtorr
    • Residual Gas AnalyzersResidual Gas Analyzers
  • AtovacAtovac
    • GVC2200Vacuum Gauge Controller
    • GPC3000/ATV1000Pressure Controller
    • GMC1200Flow&Pressure Controller
  • VarianVarian
  • IwataIwata
  • ThermoJet ESThermoJet ES
    • ThermoJet ESThermoJet ES
    • AirJet XEAirJet XE
• 设备Focean System
  • GAS材料放气率分析系统Gas analysis system
  • GMS气体混合系统Gas mixing system
  • IGS集成气路系统Integrated Gas System
  • VES真空排气系统Vacuum exhaust system
  • 实验室真空镀膜机Evaporation coating
• 服务Service
  • PolycoldPolycold
    • Polycold冷媒Polycold refrigerant
  • inTESTThermo System
  • 真空泵料件及维修服务Vacuum Pump Repair
• 应用Application
• 新闻News
  • 真空计原理Vacuum Gauge Principle
  • 半导体制造主要设备及工艺流程半导体制造主要设备及工艺流程
  • O型密封橡胶圈半导体制造主要设备及工艺流程
  • 热电偶和热电阻半导体制造主要设备及工艺流程
  • 全球半导体材料现状Current status of semiconductor materials worldwide
  • 离子源原理Ion source
  • 半导体材料解读Semiconductor material
  • Residual Gas Analyzer介绍Residual Gas Analyzer Introduction
  • 气体质量流量控制器原理MFM&MFC
  • 真空镀膜机的配置Coating
  • 电子束蒸发镀膜技术EBCoating
  • 化学气相沉积薄膜技术CVD
  • MOCVD技术介绍MOCVD
  • MBE分子束外延技术MBE
  • 真空镀膜中高纯气体的应用Coating gas application
  • 阴极电弧放电稳定性探讨MAIP
  • 真空材料的选择因素Vacuum material
  • 各真空度下的应用概况Vacuum application
  • 流体力学发展概况和趋势hydromechanics
  • AMOLED蒸镀设备中的镀膜技术应用解析AMOLED
  • 离子注入技术ion implanter
  • PECVD技术培训PECVD技术培训
  • 原子层沉积ALD技术发展及应用ALD
  • PVD真空镀膜技术PVD Technology
  • 真空计的分类Vacuum Gauge
  • 罗茨真空泵Roots vacuum pump
  • 真空镀膜技术简介Principle of vacuum gauge
  • 真空泵常识Vacuum pump
  • 真空泵的选型策略Vacuum pump selection
  • 光谱仪的原理与结构Spectrometer
  • 真空知识及漏率及检漏培训半导体制造主要设备及工艺流程
  • PVD薄膜沉积技术半导体制造主要设备及工艺流程
  • 真空测量设备选择及常用真空计简介半导体制造主要设备及工艺流程
  • 半导体洁净室的空气净化技术综述半导体制造主要设备及工艺流程
  • 半导体特种气体供应系统设计纲要半导体制造主要设备及工艺流程
  • 气柜部件—高纯阀门及部件内部结构半导体制造主要设备及工艺流程
  • PVD和CVD无机薄膜沉积方式半导体制造主要设备及工艺流程
  • 真空材料​​​​表面常见的污染与净化半导体制造主要设备及工艺流程
  • GWP数据半导体制造主要设备及工艺流程
  • 镀膜设备中常用离子源半导体制造主要设备及工艺流程
  • 离子注入原理